Tong Leung

Physical Chemistry

Room: C2 066C

Extension: 35826

Email: tong@uwaterloo.ca

Websites: Tong Leung & Waterloo Advanced Technology Lab

Research

The laboratory is one of the very few multidisciplinary laboratories in Canada. Its mission is to develop basic understanding of radiation-matter interactions for applications in the research and design of new molecular and nanoscale materials. The laboratory is fully equipped with two multiplex electron spectrometer systems with ultra fast position-sensitive detectors, two ultrahigh vacuum systems for studying novel processes on silicon (Si) single-crystal surfaces by a wide range of surface analysis techniques (LEED, AES, TPD, EELS, electron/ion bombardment, etc.), and one UHV system for ESD and time-resolved FTIR studies of technological ultra thin films.

The laboratory also houses the premier materials research facility, Waterloo Advanced Technology Lab (WATLab), in Canada's Technology Triangle, equipped with a wide range of state-of-the-art surface and nanomaterials research tools in microscopy (HR-XRD, SEM, EDX, OIM, AFM,VT-SPM), spectromicroscopy (Imaging ESCA, SAM, UPS, SIMS, Auger Microprobe, optical microscopy fleet), fabrication (ECD, CVD, MBE, PLD), lithography (EBL,Nanoman), and rapid prototyping (for bottom-up device manufacturing) for conducting exploratory studies in all emerging areas of nanotechnology and nanoscale sciences. WATLab is also the home of one of the very few helium ion microscopes in the world. As Canada's
first and only ion microscope facility, WATLab offers sub-nanometer surface imaging capability second to none in the world.

Recent publications

• L. Zhang, A. Chatterjee, K.T. Leung, J. Phys. Chem. C 115 (2011) 14155-63. “Three-stage growth of glycine and glycylglycine nanofilms on Si(111)7×7 and their thermal evolution in ultrahigh vacuum conditions: From chemisorbed adstructures to transitional layer to zwitterionic films.”
• A. Radi, K.T. Leung, Mater. Exp. 1 (2011) 144-53. “Competitive bondng of amino and hydroxyl groups in ethanolamine on Si(100)2×1: Temperature-dependent X-ray photoemission and thermal desorption studies of nanochemistry of a double-chelating agent.”
• A. Chatterjee, L. Zhang, K.T. Leung, Chem. Phys. Lett. 508 (2011) 219-23. “Computational surface chemistry of glycine on Si(111)7×7 and Si(100)2×1: Dissociative adsorption through adduct formation.”
• D. Pradhan, S.K. Mohapatra, S. Tymen, M. Misra, K.T. Leung, Mater. Exp. 1 (2011) 59-67. “Morphology-controlled ZnO nanomaterials for enhanced photoelectrochemical performance.”
• S. Jamali Gharetape, M.P. Singh, F.S. Razavi, D.A. Crandles, L.Y. Zhao, K.T. Leung, Appl. Phys. Lett. 98 (2011) 052509. “Effect of vanadium deficiency on properties of polycrystalline LaVO3.″