The Giga‑to‑Nanoelectronics (G2N) Centre is a $24M multidisciplinary research facility established in 2005 to advance nano‑scale and thin‑film electronic materials and devices. Combining world‑class fabrication, characterization, and materials synthesis capabilities, G2N enables interdisciplinary research in large‑area electronics and electronics on unconventional substrates. Open to university and external users, the Centre emphasizes hands‑on training and independent equipment use, supporting education, innovation, and impactful solutions to complex engineering challenges in Canada and beyond.
List of equipment
The following list is the equipment housed within the G2N and its location in the Engineering 3 building. 38 tools provide researchers the capability to perform thin-film deposition of metals, semiconductors and dielectric layers. More recently, the lab has expanded into two-dimensional layers for scaling of CMOS technology into next-generation devices. In addition, the lab contains photolithography and etching tools used to define and pattern layers and structures on a wafer surface. The lab also contains characterization tools to study the mechanical, structural, optical and electrical characteristics of materials and devices. The lab facilitates the microfabrication of organic and inorganic semiconductor materials for applications in thin-film transistors, organic light-emitting diodes, organic photovoltaic devices and large-scale integrated circuits.
| Equipment | Room number |
|---|---|
| UV/IR Spectrometer |
E3 3146 |
| FTIR Spectrometer |
E3 3146 |
| Raman Spectrometer |
E3 3146 |
| SU5000 SEM | E3 1120 |
| Keithley Probe Station | E3 1120 |
| Sheet Resistance | E3 1120 |
| Dektak | E3 1120 |
| Filmetrics Spectrometer | E3 1120 |
| Dicing Saw | E3 1129 |
| AJA Sputtering | E3 1120 |
| Film Stress Gauge | E3 1120 |
| Vacuum Oven | E3 1120 |
| General Oven | E3 1120 |
| Lithography MA6 | E3 1137 |
| Mask Aligner MJB3 | E3 1137 |
| Intlvac Glove Box | E3 1136 |
| Intlvac Thermal Evaporator | E3 1136 |
| Intlvac E-beam Evaporator | E3 1136 |
| EvoVac Evaporator | E3 1136 |
| Equipment | Room number |
|---|---|
| RIE Metal | E3 1131 |
| RIE Oxide | E3 3136 |
| RIE Polymer | E3 3136 |
| Kurt J. Lesker Se Evaporator | E3 1133 |
| Intlvac Se Evaporator | E3 1133 |
| Parylene Coater | E3 3139 |
| WL01 Cluster | E3 1136 |
| WL02 Cluster | E3 1131 |
| WLOS Sputter | E3 1131 |
| Edwards Sputtering | E3 1131 |
| Spin coater | E3 1137A |
| Wetbenches | E3 117 & 1137A |
| Vigor Glove Box | E3 3145 |
| Angstrom G/B Evaporator | E31145 |
| Optical microscope | E3 1137 |
| CVD/ALD cluster | E3 1131 |
| Au coater | E3 3139 |
| AFM | E3 3139 |
| XRD | XRD |
Facility management
Website
For more complete information, visit the core facility website: Giga-to-Nanoelectronics Centre