The
microelectronic
market
imposes
tight
requirements
upon
thin
film
properties,
such
as
surface
roughness
and
film
thickness.
Thin
film
deposition
is
a
batch
process
where
the
microscopic
events
determine
the
configuration
of
the
thin
film
surface.
However,
manipulating
the
process
at
the
macroscopic
level
is
essential
to
the
product
quality.
There
are
three
major
obstacles
for
developing
efficient
control
methodologies
for
thin
film
deposition
in
the
semiconductor
industry:
i)
development
of
fundamental
mathematical
models
describing
the
multiscale
nature
of
this
process,
ii)
lack
of
practical
in-situ
sensors
that
provide
real-time
measurements
for
online
control,
and
iii)
uncertainties
in
the
microscale
mechanisms
and
parameters
of
the
system.
The
main
goal
of
my
research
is
to
address
these
challenges
for
robust
control
and
optimization
purposes
in
the
multiscale
thin
film
deposition
process. The
respective
publications
of
this
project
is
available
in here.
Thesis: Uncertainty
Analysis
and
Control
of
Multiscale
Process
Systems
