PhD student
Contact
Email: jrgodin@uwaterloo.ca
Phone: +1-519-888-4567 ext. 35073
Education
- Candidate for PhD, University of Waterloo, Waterloo, Ontario, Canada
- MASc, Mathematics Université de Sherbrooke, Sherbrooke, Quebec, Canada, 2009
- BASc, Honours Physics, Bishops University, Sherbrooke, Quebec, Canada, 2006
Research interests
- Reliability of micro-electromechanical systems (MEMS) devices
Publications
Refereed journal publications
- Edery A., and Godin J., "Second order Kerr deflection," Gen. Rel. Grav. 38 (2006) 1715.
Full papers in refereed conference proceedings
MEMS = Micro-electromechanical systems
MOEMS = Micro-(opto)-electromechanical systems
ASME = American Society of Mechanical Engineers
SPIE = The Society of Photographic Instrumentation Engineers
PECVD = Plasma-enhanced chemical vapor deposition
- P. Nieva, J. Godin, R. Norris, A. Sohi, T. Leung, "Effects of dry plasma releasing process parameters and induced in-plane stress on MEMS devices yield", SPIE Photonics West 2012 MEMS-MOEMS, January 2012.
- Godin J., Won S.P., Nieva P.M., Phong L.N., and Pope T., "Residual stress dependency on wafer location of thin film pecvd silicon nitride." Boston: TechConnect World, 2011.
- E. Bassiachvili, J. R. Godin, P. Nieva, and A. Khajepour, “On-chip structures for the determination of the dopant-dependent young’s modulus of heavily phosphorus doped polysilicon with stress compensation,” pp. 45–50, Jan. 2010.