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University of Waterloo

Worst-case and distributional robustness analysis of a thin film deposition process

Citation:

Rasoulian, S. , & Ricardez-Sandoval, L. A. . (2015). Worst-case and distributional robustness analysis of a thin film deposition process. IFAC-PapersOnLine, 48, 1126–1131. Elsevier.

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E6 3014

519-888-4567 , ext. 38667

laricardezsandoval@uwaterloo.ca

University of Waterloo

University of Waterloo

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Waterloo, ON, Canada N2L 3G1

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