Tada, H. ., Abramson, A. R., Miaoulis, I. N., Wong, P. Y., Nieva, P. ., & Zavracky, P. . (1998). Effects of surface patterning in thin film structures on the thermal radiative properties during rapid thermal processing. ASME HEAT TRANSFER DIV PUBL HTD, 361, 93-98.
Reference author: Paul Zavracky
First name
Paul
Last name
Zavracky
Nieva, P. ., Tada, H. ., Zavracky, P. ., Adams, G. ., Miaoulis, I. ., & Wong, P. . (1998). Mechanical and thermophysical properties of silicon nitride thin films at high temperatures using in-situ MEMS temperature sensors. MRS Online Proceedings Library (OPL), 546.
Tada, H. ., Kumpel, A. E., Lathrop, R. E., Slanina, J. B., Nieva, P. ., Zavracky, P. ., Miaoulis, I. N., & Wong, P. Y. (2000). Novel imaging system for measuring microscale curvatures at high temperatures. Review of Scientific Instruments, 71, 161-167.
Tada, H. ., Kumpel, A. E., Lathrop, R. E., Slanina, J. B., Nieva, P. ., Zavracky, P. ., Miaoulis, I. N., & Wong, P. Y. (2000). STRUCTURAL, MECHANICAL, THERMODYNAMIC, AND OPTICAL PROPERTIES OF CONDENSED MATTER (PACS 61-68, 78)-Thermal expansion coefficient of polycrystalline silicon and silicon dioxide thin films at high. Journal of Applied Physics, 87, 4189-4193.
Tada, H. ., Kumpel, A. E., Lathrop, R. E., Slanina, J. B., Nieva, P. ., Zavracky, P. ., Miaoulis, I. N., & Wong, P. Y. (2000). Thermal expansion coefficient of polycrystalline silicon and silicon dioxide thin films at high temperatures. Journal of Applied Physics, 87, 4189-4193.
Bargmann, M. ., Kumpel, A. ., Tada, H. ., Nieva, P. ., Zavracky, P. ., Miaoulis, I. N., & Wong, P. Y. (1999). Temperature-dependent coefficient of thermal expansion of silicon nitride films used in microelectromechanical systems. MRS Online Proceedings Library, 605, 235-240.