The Quantum-Nano Fabrication and Characterization Facility (QNFCF) is pleased to announce updates to the SUSS MA6 mask aligner. The UV light source, which utilizes a high pressure, short arc mercury lamp, has been upgraded to a light source utilizing a UV-LED lamp.The UV-LED upgrade lamp will provide improvements to functionality, sustainability, and cost of operation. The system has been re-commissioned and is now available for use in the QNFCF cleanroom lab.
High-pressure, short-arc mercury lamps have long been the industry-standard as an ultraviolet (UV) light source for photolithography to deliver precise, high-intensity, and stable output at wavelengths: 365nm i-line, 405nm h-line, 436nm g-line. However, mercury lamps have very short life spans, and by their nature generate significant mercury-contaminated solid waste once expired.Thanks to the advances in LED technology, UV-LEDs have become a very attractive alternative to the hazardous and energy-consuming mercury lamps.With generous support from the University of Waterloo Sustainability Office and Transformative Quantum Technologies (TQT), the QNFCF team have upgraded the MA6 mask aligner by switching the lamp source from mercury to UV-LED.
SUSS MA6 mask aligner with Idonus UV-LED control panel installed.