GenIsys Beamer & Tracer Seminar
Kaustubh Vyas from GenISys will be hosting a technical workshop on the Beamer and Tracer products used to prepare pattern data for QNFCF’s JEOL JBX6300FS Electron Beam Lithography tool. This seminar is open to all current and prospective users of the JEOL-EBL system. This is an interactive seminar which will cover topics such as:
- In depth training on Beamer functions with practical pattern examples
- Example Beamer workflows to accomplish specific optimizations such as faster write times, reduced stitching or reduced line edge roughness
- In depth training on Tracer for proximity effect correction
There will also be time in the workshop for attendees to work on their own GDS-II patterns and receive expert advice and support from Kaustubh.
Beamer and Tracer licenses will be provided to attendees for the day so they can follow the workshop program on their own laptop. Attendees must plan to bring a windows laptop and a two-button mouse. Space is limited. Please review the event details and follow the registration link if you wish to attend.
Event details:
- Date: October 27th 2026
- Time: 1:00PM – 5:00PM
- Location: QNC 1201
- Registration link