A library of common process recipes is available for all lab members via the Plone "wiki style" website (authentication required) of the Quantum-Nano Fabrication and Characterization Facility. The goal of these process documents is to provide clearly documented and useful recipes for processes that are of common interest to the lab community. Documented processes include:
- UV lithography process for S1811 positive tone photoresist
- UV lithography process for Ma-N 1410 negative tone photoresist
- Indium Tin Oxide thin film deposition
- Temporary substrate bonding (for DRIE processes) with Crystalbond 555 HMP
S1811 UV lithography process
S1811-PMGI bilayer UV lithography for enhanced lift-off
Raith150-TWO proximity effect correction
ITO thin film deposition
Transmission profile for unannealed and annealed ITO transparent conductive oxide.
ma-N 1410 negative tone UV lithography
