On Friday June 23rd, Dr. Kaustubh Vyas from GenISys GmbH hosted a training workshop on BEAMER and TRACER advanced software packages for Electron Beam Lithography (EBL) pattern preparation. BEAMER and TRACER are powerful, GUI-based software packages that enable advanced processing of GDS-II pattern files in order to optimize pattern fidelity and throughput on EBL tools. Fourteen QNFCF labmembers participated in the six-hour training event starting with basic operations training on BEAMER and TRACER packages, then moving on to an open session where labmembers were encouraged to bring their own patterns for application specific data processing.
Prior to joining GenISys GmbH Dr. Vyas completed his PhD at the University of Ottawa under Dr. Ksenia Dogaleva. Dr. Vyas is a former QNFCF labmember and was trained on our own JEOL JBX-6300FS Electron Beam Lithography system in 2019 as part of his PhD work on integrated optical devices in III-V materials.
You can read more about this successful workshop from this Linkedin post by GenISys GMBH.
