Vendor: Allwin21 Corp.
Model: AccuThermo AW 610
Purpose: Short duration, high-temperature processing of wafers and pieces
Equipment description:
The AW610 rapid thermal processing (RTP) system uses high intensity visible radiation to heat single wafers for short process periods of time (typically 10 minutes or less) at precisely controlled temperatures up to 800°C. The system is a cold wall quartz chamber in which the sample is heated with top and bottom arrays of high intensity halogen lamps using closed-loop temperature control with feedback via a thermocouple. Typical processes for this tool include metal-silicide formation or very thin thermal oxidation. Permitted processes and materials as well as equipment manuals are available on the equipment wiki page.
Gases currently available on this system:
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N2
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O2
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Ar
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Forming gas (5% H2 / 95% N2)
System features and options:
- System is configured to handle 100 mm and 150 mm Si wafers
- Small pieces may be processed by placing on Si "carrier" wafer or using susceptor
- Communal susceptor is available for the processing of III-V and other exotic materials
- Temperature feedback control via thermocouple only (processes limited to < 800°C)
Note: Photoresist-coated wafers are strictly prohibited since the system supports high temperature processes which are not compatible with photoresist films.
