Vendor:
Scienta
Omicron
Model:
Custom
Multi-Module
UHV
Growth
&
Analysis
System: Metals
MBE
Growth
Chamber
Purpose: MBE
growth
of
metal
thin
films
Characteristics:
- UHV chamber with base pressure better than 5e-10 Torr
- 2" diameter substrate handling (and smaller)
- Substrate tilting to +/- 90 degrees
- Substrate rotation 0 to 30 rpm
- Substrate heating to 1100C (oxygen compatible to 600C)
- High-temperature (1900C) effusion cells (2)
- Low-temperature (<1000C) effusion cells (3)
- RHEED system for in-situ thin film growth analysis
- RF plasma source for delivering atomic oxygen gas onto substrates
- Automated thin film deposition monitor and control
Permitted depositions:
-
TBD