Vendor: Reynoldstech
Model: Custom
Purpose: Development of photoresists in acqueous-base developers
Equipment description:
This wetbench is dedicated to the development of photolithography samples using aqueous, mild-base developers (MF-319, MicroDev, etc…). For more information about available processes and disallowed processes, please consult the equipment wiki page.
System features and options:
- Foot-pedal actuated deionized (DI) water gooseneck
- DI water and nitrogen spray guns
- Sink
- Drying rack
