Vendor:
Scienta
Omicron
Model:
Custom
Multi-Module
UHV
Growth
&
Analysis
System: Superconducting
Materials
Sputter
Deposition
Chamber
Purpose: Sputter
deposition
of
superconducting
thin
films
Characteristics:
- UHV chamber with base pressure better than 5e-9 Torr
- 2" diameter substrate handling (and smaller)
- Substrate rotation 0 to 60 rpm
- Substrate heating to 850C in oxygen environment
- DC and RF substrate biasing up to 100W
- 8 UHV compatible magnetron sputter guns configured for both DC and RF sputtering
- Accommodates co-sputtering with 3 or more sources
- Automated thin film deposition monitor and control
Permitted depositions:
-
TBD