Zeiss Auriga 40 scanning electron microscope/focused ion beam [ZEISS-SEMFIB]

Vendor: Zeiss

Model: AURIGA 40 scanning electron microscope (SEM)/focused ion beam (FIB)

Purpose: Sample preparation and precision micro-milling of various solid materials for transmission electron microscopy (TEM)

Equipment wiki link

Equipment description:

The AURIGA 40 SEM/FIB is a field emission scanning electron microscope, equipped with a focused ion beam column for localized etching of solid samples. This system is ideal for micro-scale patterned etching and preparation of lamellas for TEM microscopy.

System features:

  • Zeiss GEMINI electron column
  • SEM resolution of: 1.9 nm @ 1 kV / 1.0 nm @ 15kV
  • Orsay Physics Cobra Ga ion column
  • Detectors:
    • InLens
    • Secondary electrons secondary ions (SESI)
    • Energy selective backscattered (EsB)
    • NTS backscattered electrons (BSD)
    • Scanning transmission electron micrscope (STEM)
  • 5-channel gas injection (Pt, C, F, H2O, SiO2)
  • Charge compensation
  • Micromanipulator
  • Fibics NanoPatterning and Vizualization Engine (NVPE)

Zeiss Auriga FIB/SEM
Zeiss Auriga FIB/SEM
TQT logo milled into silicon
TQT logo milled into silicon