Purpose: Removal of organic residues and general substrate cleaning using mixtures of sulphuric acid and hydrogen peroxide
The Reynoldstech Piranha organics clean and resist strip wetbench is dedicated to the removal of hardened photoresist residues and general cleaning of wafers. This wetbench is equipped with an automated quick dump rinse (QDR)/cascade tank, a sink and an aspirator for cleanup. For more information about available processes and disallowed processes, please consult the equipment wiki page.
System features and options:
- Foot-pedal actuated deionized (DI) water gooseneck
- DI water and nitrogen spray guns
- Temperature-controlled quartz bath
- QDR/cascade rinse tank
- Adjacent automated spin rinser/dryers for post-process rinsing and drying of batches of up to 25 wafers at once