Purpose: Solvent cleaning, metal lift-off, resist stripping and development of photoresists in solvent-based developers
This wetbench is dedicated to solvent cleaning, metal lift-off, resist stripping and resist development with solvent based developers. It is equipped with an automated quick dump rinse (QDR)/Cascade tank. For more information about available processes and disallowed processes, please consult the equipment wiki page.
System features and options:
- Deionized (DI) water and nitrogen spray guns
- QDR/Cascade rinse tank
- Stand-alone ultrasonic bath and stirred hotplate