Vendor: Reynoldstech

Model: Custom

Purpose:  Development of photoresists in acqueous-base developers

Equipment wiki link

Equipment description:

This wetbench is dedicated to the development of photolithography samples using aqueous, mild-base developers (MF-319, MicroDev, etc…). For more information about available processes and disallowed processes, please consult the equipment wiki page.

System features and options:

  • Foot-pedal actuated deionized (DI) water gooseneck
  • DI water and nitrogen spray guns
  • Sink
  • Drying rack