Vendor:
Reynoldstech
Model:
Custom
Purpose:
Bulk
wet
silicon
oxide
etch
via
solutions
of
hydrofluoric
acid
(HF)
Equipment description
Wet bench dedicated for hydrofluoric (HF) acid-based processes and cleans. Only HF and HF-based etchants are permitted on this bench due to the severe hazard they pose.
Available Options:
- Dionized water and nitrogen spray guns
- Drying rack
