Vendor:   Reynoldstech
Model:     Custom
Purpose:  Bulk wet silicon oxide etch via solutions of hydrofluoric acid (HF)

Equipment description

Wet bench dedicated for hydrofluoric (HF) acid-based processes and cleans. Only HF and HF-based etchants are permitted on this bench due to the severe hazard they pose.

Equipment wiki link

Available Options:

  • Dionized water and nitrogen spray guns
  • Drying rack