Vendor: Reynoldstech
Model: Custom
Purpose: Bulk wet silicon oxide etch via solutions of hydrofluoric acid (HF)
Equipment description
Wet bench dedicated for hydrofluoric (HF) acid-based processes and cleans. Only HF and HF-based etchants are permitted on this bench due to the severe hazard they pose.
Available Options:
- Dionized water and nitrogen spray guns
- Drying rack
RAC1 HF acid wetbench
