Vendor: Yield Engineering Systems
Model: 310-TA vacuum oven
Purpose: Vapour priming substrates with HMDS (adhesion promoter) prior to photoresist coat and image reversal
Equipment description:
The YES-310TA vapor prime equipment allows the application of HMDS in a monolayer onto the surface of silicon wafers. A heated chamber, process pressure in the millitorr range and NH3 connected allow the tool to use for image reversal processes as well.
System features and options:
- Ammonia-based image reversal option
