Vendor: Yield Engineering Systems

Model: 310-TA vacuum oven

Purpose: Vapour priming substrates with HMDS (adhesion promoter) prior to photoresist coat and image reversal

Equipment wiki link

Equipment description:

The YES-310TA vapor prime equipment allows the application of HMDS in a monolayer onto the surface of silicon wafers. A heated chamber, process pressure in the millitorr range and NH3 connected allow the tool to use for image reversal processes as well.

System features and options: