Vendor: Angstrom Engineering
Model: Indium Series™ evaporator
Purpose: Indium evaporation to form high-aspect ratio bumps
Equipment description:
The Indium Series™ evaporator is a thermal evaporator dedicated to the deposition of indium to form bumps. A 28cc alumina crucible allows deposition of indium up to 20 µm in one run with a deposition rate up to 100 Å/s. Rate control and deposited thickness are monitored with no interruption thanks to a multi-quartz crystal microbalance.
This system is equipped with a large cryopump, a recirculating chiller for substrate temperature control and a collimation plate. The Aeres computer interface enables automated pumping/venting and the construction of complex deposition recipes.
Equipment wiki link
System features and options:
- Ultimate base pressure of <1e-7 Torr
- Water-cooled chamber walls and mid-height shield/collimation plate
- Variable-height stage:
- Source to substrate distance between 583 mm (23’’) and 685 mm (27’’)
- 10 and 30 rpm rotation
- Temperature-controlled with recirculating fluid between -30 and 125°C (stage temperature between -25 and 115 °C).
- Generic sample holder for susbtrates up to 200 mm and two single-wafer holders for 100 mm and 150 mm wafers.
- Thermal evaporation source with 6 kVA transformer for deposition rate up to 100 Å/s
- 12 quartz monitor crystals in one sensor head for continuous and accurate deposition
- Source/substrate shutter
- Shuttered viewport
