Vendor:
Plasma
Etch
Model:
Purpose:
Plasma
cleaning
of
substrates
Equipment description:
System features:
- Glovebox interface
- 300W 13.56 MHz power supply
-
Available
gases
- Ar
- O2
- CHF3
Gloveboxed Reactive Ion Etch [Inert-PLASMAETCH-RIE-R1]