Gloveboxed Reactive Ion Etch [Inert-PLASMAETCH-RIE-R1]

Vendor:   Plasma Etch
Model:     
Purpose:  Plasma cleaning of substrates

Equipment description:

System features:

• Glovebox interface
• 300W 13.56 MHz power supply
• Available gases
  • Ar
  • O₂
  • CHF₃