Vendor: Laurell Technologies
Model: WS-1000MH
Purpose: Spin coating UV resists on wafers and pieces
Equipment description:
The Laurell spincoater is able to coat wafers up to 6” in diameter using user-programmed spin profiles. The coater includes a port in the lid for photoresist application while spinning. Maximum rotational speed is 12,000 rpm.
Equipment wiki link
System features and options:
- Integration into exhausted benchtop
