Vendor: Angstrom Engineering
Model: LPCVD
Purpose: Growth of carbon nanotubes via low prressure chemical vapor deposition
Equipment description:
The Angstrom Engineering LPCVD is capable of growing carbon nanotubes (CNTs) and graphene via high temperature reaction with suitable catalyst films/particles. The system is capable of processing one sample up to 150 mm in diameter. The system is comprosed of a 8″ diamater quartz tube chamber within a 3-zone furnace. Maximum process temperature is 1100℃ and there is a "rapid cool" option to shorten run time. Vacuum for the system is provided by a 8400 L/min dry roughing pump. Downstream pressure control enables stable process pressures from 10 mTorr to 500 Torr.
Gases currently available:
- N2
- Ar
- CH4
- H2
Additional Information:
This system is capable of operating at temperatures up to 1100℃. Uncleaned samples and samples with polymeric films are strictly prohibited. All materials going into this system should specifically be listed in the authorized materials page.
