Vendor: Angstrom Engineering
Purpose: Growth of carbon nanotubes via low prressure chemical vapor deposition
The Angstrom Engineering LPCVD is capable of growing carbon nanotubes (CNTs) and graphene via high temperature reaction with suitable catalyst films/particles. The system is capable of processing one sample up to 150 mm in diameter. The system is comprosed of a 8″ diamater quartz tube chamber within a 3-zone furnace. Maximum process temperature is 1100℃ and there is a "rapid cool" option to shorten run time. Vacuum for the system is provided by a 8400 L/min dry roughing pump. Downstream pressure control enables stable process pressures from 10 mTorr to 500 Torr.
Gases currently available:
This system is capable of operating at temperatures up to 1100℃. Uncleaned samples and samples with polymeric films are strictly prohibited. All materials going into this system should specifically be listed in the authorized materials page.