Vendor: Scienta Omicron
Model: Custom Multi-Module UHV Growth & Analysis System: Surface Analysis sub-system
Purpose: In-situ analysis of thin films
Characteristics:
- UHV chamber with base pressure better than 5e-10 Torr
- 2" diameter substrate handling (and smaller)
- Substrate heating to 500C
- Capable of X-Ray photoelectron spectroscopy (XPS), ultra-violet photoelectron spectroscopy (UPS), Auger electron spectroscopy (AES) and depth profiling
- Electron energy analyser:
- Mu-metal shielding
- Kinetic energy range >1500 eV
- High count rates for fast quantification
- Multi-channel detector allows various acquisition modes including scanning and snapshot modes
- X-ray source:
- Al/Mg dual anodes
- 15 kV, 1000 W
- UV Source:
- Source photon flux >1E16 photons/s.sr
- Differential pumping
- Electron beam source:
- Energy range: 100 eV to 5keV
- Max beam current: 10 uA
- Includes flood gun for charge neutralization
- Includes sputter etching gun with differential pumping
- Includes fast-entry chamber for quickly introducing 1" (or smaller) test samples directly into this UHV chamber
