OMICRON-MBE-MM (Sputter Deposition of Magnetic Materials)

Vendor:   Scienta Omicron
Model:    Custom Multi-Module UHV Growth & Analysis System: Magnetic Materials Sputter Deposition Chamber
Purpose: Sputter deposition of magnetic thin films

Equipment Wiki Link
 

Characteristics:

• UHV chamber with base pressure better than 5e-9 Torr
• 2" diameter substrate handling (and smaller)
• Substrate rotation 0 to 60 rpm
• Substrate heating to 850C in oxygen environment
• DC and RF substrate biasing up to 100W
• 12 UHV compatible magnetron sputter guns configured for both DC and RF sputtering
• Automated thin film deposition monitor and control

Permitted depositions:

• TBD