Vendor: Scienta Omicron
Model: Custom Multi-Module UHV Growth & Analysis System: Superconducting Materials Sputter Deposition Chamber
Purpose: Sputter deposition of superconducting thin films
Characteristics:
- UHV chamber with base pressure better than 5e-9 Torr
- 2" diameter substrate handling (and smaller)
- Substrate rotation 0 to 60 rpm
- Substrate heating to 850C in oxygen environment
- DC and RF substrate biasing up to 100W
- 8 UHV compatible magnetron sputter guns configured for both DC and RF sputtering
- Accommodates co-sputtering with 3 or more sources
- Automated thin film deposition monitor and control
Permitted depositions:
-
TBD
