Vendor:
Scienta
Omicron
Model:
Custom
Multi-Module
UHV
Growth
&
Analysis
System: Preparation
Sub-Chamber
for
MBE
System
Purpose: Preparing
samples
prior
to
introducing
these
into
multi-module
MBE
growth
system
Characteristics:
- UHV chamber with base pressure better than 5e-10 Torr
- 2" diameter substrate handling (and smaller)
- Substrate heating to 700C in oxygen environment
- RF substrate biasing up to 100W
-
Ion/plasma
source
for
substrate
cleaning
capable
of
both:
- High kinetic energy, highly anisotropic ion beam for sputter etching
- Low kinetic energy, chemically reactive, atom beam for nitridation/oxidation