Vendor: Scienta Omicron
Model: Custom Multi-Module UHV Growth & Analysis System: Preparation Sub-Chamber for MBE System
Purpose: Preparing samples prior to introducing these into multi-module MBE growth system
Characteristics:
- UHV chamber with base pressure better than 5e-10 Torr
- 2" diameter substrate handling (and smaller)
- Substrate heating to 700C in oxygen environment
- RF substrate biasing up to 100W
- Ion/plasma source for substrate cleaning capable of both:
- High kinetic energy, highly anisotropic ion beam for sputter etching
- Low kinetic energy, chemically reactive, atom beam for nitridation/oxidation
