Vendor: AJA International Inc.
Model:
Purpose: Physical vapour deposition of thin films via sputter deposition and E-beam evaporation
Location: RAC2-2021
Equipment description:
The AJA dual system is a high-vacuum physical vapour deposition tool that consists of a loadlock, a sputtering and an e-beam evaporation chamber.
System features and options:
- System designed for 3" wafers and smaller
- Multi-position loadlock for quick loading of multiple samples
- Quartz lamp substrate heating up to 850℃
- Variable substrate height
- Base pressure < 1x10-8 Torr
- Magnetron sputter chamber is equipped with 10 sputter guns and an atomic gas source for the reactive growth of oxides and nitrides
- Evaporation chamber is equipped with one e-gun (5-pocket, 5kW) and four thermal sources.
AJA Sputter/E-beam deposition system
