MASc Seminar Notice: "Fabrication of High Solid Silicon Microneedles Based on KOH Anisotropic Etching" by Zihao Wang

Abstract

The presentation is based on the solid silicon microneedles fabrication by KOH etching. First, a general introduction of microneedles is presented including its classifications, functions, and applications. Secondly, the fabrication process of microneedles is introduced including mask patterning, etching, and characterization. Thirdly, A model for growth of microneedles in KOH etching is established, revealing the relationship between microneedle height versus mask size and etching time. Lastly, in order to keep high microneedles a good height uniformity, additional SF6 reactive ion etching is carried, which can improve the height uniformity of microneedles as well as the tip sharpness of microneedles.

Supervisor: Bo Cui