The Quantum-Nano Fabrication and Characterization Facility (QNFCF) is now pleased to offer user training and support for the new Stensborg Desktop R2P NanoImprinter in the QNC Cleanroom. This Nano Imprint Lithography (NIL) system uses pressure and UV light to enable the user to replicate nanoscale features from a pre-fabricated mould.
The power of NIL is that it can be used to replicate nanoscale features much more quickly than the QNFCF's direct write lithography tools (Heidelberg, Raith, JEOL). The downside of the NIL approach is that it can only replicate pre-existing patterns from previously fabricated masters and moulds, so it is more time-consuming to make iterative improvements to your lithography patterns.
The system features:
- Max imprint size: 105 x 188 mm, thickness up to 11 mm
- Typical replication speed: 60 replicas per hour
- Adjustable imprinting force: 1-1000 N
- UV curing: 395 nm LED with adjustable output power up to 1.8 W/cm
- Variable plate imprinting speed: 0.01 – 5 m/min
This new shared capability has been made available to the QNFCF community through support from NSERC RTI project 2025-00071, led by Sebastian Schulz.
Interested researchers are encouraged to send their new project inquiries to Greg Holloway.
Application: Pattern transfer on flexible substrate
The Stensborg NIL utilizes a roll-to-plate imprinting method allowing for pattern transfer onto flexible substrates. Image below shows the first successful imprint on the tool where the demo pattern is transferred to resin on a PET film. The pattern contains features with a pitch of 500 nm.
