Designs should be submitted in GDSII format. Tanner L-Edit is the recommended layout software. However, most of the other layout software tools can export to GDS format including CoventorWare. A template for this process can be found on our website. The layers should match the numbers posted in Table 3 of this handbook.
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Custom UW-MEMS Process
The CIRFE facility has capability to provide a modified version of the UW-MEMS process on a case by case basis. Designers will be able to select thickness of materials, type of structural and sacrificial layers and number of layers. The CIRFE facility also offers a variety of thin film metal and dielectric deposition services.
For inquiry about the CUSTOM UW-MEMS Processes, please e-mail: firstname.lastname@example.org