![Angstrom DC/RF Sputtering System](/centre-integrated-rf-engineering/sites/default/files/uploads/images/img_5651_0.jpg)
- Two 3" sputtering sources for DC Magnetron and RF sputtering
- Loadlock for quick loading/unloading of wafers
- Stage heating till 850 degC and rotation of substrate holder
- Ultra-fast 2-3 min wafer transfer
- Fully automated and friendly GUI
- Up to 100 mm wafers
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