- Combination e-beam evaporator and DC magnetron sputtering system
- Possible to sputter and/or evaporate multiple runs without breaking vacuum
- 1 x four pocket e-beam gun
- 1 x 6” DC sputtering gun (Argon used as sputtering gas)
- Automatic pump down cycle
- Automatic e-beam deposition process with rate controller
- Semi-automatic sputtering process; operator enters deposition time based on specific sputtering process
-
Materials
available
for
evaporation:
- aluminum, gold, chromium, nickel, titanium
-
Materials
available
for
sputtering:
- gold, copper, aluminum, silver, titanium-tungsten
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