COVID-19 updates:

University of Waterloo Coronavirus Information website

See list of Faculty of Engineering Modified Services

The Giga-to-Nanoelectronics Centre has reopened for research activities, as of August 17 2020.  Researchers wishing to use the facilities are required to review the new and additional safety material listed in the link at the left side of this page.

Edwards sputtering system

Edwards sputtering systemMetals, semiconductors and dielectrics can be deposited using "sputtering" systems.

In sputtering a gas is ionized by a direct current (DC) or radio frequency (RF) electric source. The ions are accelerated to a target and the impact sputters off atoms that are deposited on a substrate.

Edwards sputtering system is used to deposit chromium (Cr), aluminum (Al) and molybdenum (Mo) metals on 3 inch wafers using argon (Ar) gas.

Both DC and RF power sources are available for sputtering. The deposition rate is controlled by varying the applied power, and can be as high as a few um/hr with good film quality in terms of conductivity and uniformity.

User fees for the Edwards sputtering system.