COVID-19 updates:

University of Waterloo Coronavirus Information website

See list of Faculty of Engineering Modified Services

The Giga-to-Nanoelectronics Centre has reopened for research activities, as of August 17 2020.  Researchers wishing to use the facilities are required to review the new and additional safety material listed in the link at the left side of this page.

Karl suss mask aligner MJB3

Karl Suss Mask Aligner MJB3The SUSS MJB 3 mask aligner is designed for high-resolution photolithography in a laboratory or pilot production environment. It can produce line/space photoresist images down to 0.6 um with alignment accuracy down to 1 um under optimum conditions.

It is capable of processing silicon, glass, or other standard wafers up to 3” diameter (round). This system is equipped with SUSS diffraction to reduce exposure optics. A 350W mercury short-arc lamp is used, providing a broadband of exposure wavelengths of 350-450nm.

It can perform exposures in vacuum contact, hard contact, soft contact, or proximity mode.

Find out what we charge to use the Karl suss MJB3 mask aligner.

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