COVID-19 updates:

University of Waterloo Coronavirus Information website

See list of Faculty of Engineering Modified Services

The Giga-to-Nanoelectronics Centre has reopened for research activities, as of August 17 2020.  Researchers wishing to use the facilities are required to review the new and additional safety material listed in the link at the left side of this page.

Phantom II RIE

The Phantom II Reactive-ion Etching system is plasma etch system designed by Trion Technology Inc. to provide state-of-the-art plasma etch capability using single wafers.

Giga-to-Nanoelectronics (G2N) Centre has 3 systems: one with CF4 and SF6 process gases to etch silicon based materials; one with O2 process gas for polymer/photoresist/plastics etching; and one with Cl2 for Al or III-V materials etching (the last one equipped with load-lock chamber for safety). Argon and hydrogen gas are also connected.

Each machine has two power sources: Radio Frequency (RF) (13.56 MHz) 600W source and ICP 1000W source. Wafers of maximum size 8 inches can be processed.

User fees for the Phantom II RIE system