COVID-19 updates:

University of Waterloo Coronavirus Information website

See list of Faculty of Engineering Modified Services

The Giga-to-Nanoelectronics Centre has reopened for research activities, as of August 17 2020.  Researchers wishing to use the facilities are required to review the new and additional safety material listed in the link at the left side of this page.

WLOS cluster sputtering system

WLOS Cluster Sputtering SystemWLOS sputtering provides a maximum deposition area of 39cm x 27cm. Substrate holders for 3", 5" and 6" circular and square wafers are available for Cr and Al metals using a direct current power supply and Mo using a radio frequency source.

The system features a substrate heater for sample treatment at temperatures up to 400 degrees Celsius.

The deposition rate of this system is in the range of 0.05 - 0.2 um/hr with very uniform film thickness and good conductivity.

User fees for the WLOS cluster sputtering tool.