Vendor: Tousimis
Model: Autosamdri-815B, Series C
Purpose: Critical point drying of membranes and cantilevers after release in liquid
Equipment description:
The critical point dryer removes liquids that may damage membranes and cantilevers because of stiction. After release in a wet etchant (either HF or KOH or solvent depending on the sacrificial material), devices are immersed in IPA which is then replaced by liquid CO2 in the critical point dryer. Above the critical point of liquid CO2, the samples are dried. For more information about available processes and disallowed processes, please consult the equipment wiki page.
System features and options:
- Process up to five 4″ wafers per run
- HF compatible substrate holders with chamber inserts for 5x10 mm square dies and 2″, 3″ and 4″ wafers
- Integrated chiller loop for lower LCO2 consumption
Tousimis critical point dryer
