Please join the Waterloo Institute for Nanotechnology and the Department of Electrical and Computer Engineering on Monday, July 15, 2019 for a guest lecture by Dr. Sven Achenbach from the University of Saskatchewan. He will be speaking on "High Aspect Ratio Polymer and Metal Patterning at the Synchrotron Laboratory for Micro and Nano Devices (SyLMAND), Canadian Light Source". [Poster]
Abstract:
Deep
X-ray
lithography
(XRL)
complements
other
micro
and
nano
fabrication
processes
available
in
Canada.
While
many
patterning
processes
traditionally
target
highest
lateral
resolution
in
shallow
films
and
often
focus
on
silicon
materials,
XRL
is
commonly
optimized
for
the
patterning
of
thick
resist
layers
(typically,
up
to
hundreds
of
micrometers
or
even
millimeters)
with
high
aspect
ratios
(ratio
of
thickness
to
minimum
lateral
feature
size;
up
to
100:1),
and
smooth
and
vertical
sidewalls,
at
reduced
requirements
on
lateral
resolution.
XRL
can
be
combined
with
subsequent
process
steps
of
the
LIGA
process
(German
acronym
for
lithography,
electroplating,
and
replication)
to
obtain
a
wider
variety
of
patterned
materials
(including
polymers,
metals
and
ceramics)
and
to
reduce
the
cost
per
patterned
component
by
mass
replication
rather
than
individual
lithography.
In
Canada,
XRL
has
recently
become
available
to
the
scientific
community
and
to
industrial
users
as
SyLMAND,
the
Synchrotron
Laboratory
for
Micro
and
Nano
Devices
of
the
Canadian
Light
Source
(CLS)
in
Saskatoon,
became
operational.
The
talk
will
give
a
brief
introduction
to
XRL
processing,
explain
some
of
SyLMAND’s
unique
contributions
to
XRL
instrumentation
and
technology,
and
highlight
selected
applications
in
the
areas
of
vertical
wall
radio
frequency
(RF)
MEMS
and
antennas,
X-ray
optics,
and
fluidics.
Bio:
Following several Research Assistant positions and a research stipend at the National Research Center CNRS-LURE, Paris, France, he was a Post Doctoral Fellow at the Research Center Karlsruhe, Germany (2000 to 2003), focusing on deep X-ray lithography process technology. In 2003, he was awarded a tenured Research Scientist position at the Institute of Microstructure Technology in Karlsruhe. In 2005, he assumed an Associate Professorship in the Department of Electrical and Computer Engineering, University of Saskatchewan, Canada, where he was promoted to Full ProfHighessor in 2009 and was appointed as a TR Labs Adjunct Scientist. His research interests include instrumentation and process development for polymer- and metal-based micro- and nano devices and applications such as RF-MEMS, optics, and micro/nano fluidics. In the past decade, he has conceptualized and developed the Synchrotron Laboratory for Micro and Nano Devices (SyLMAND), Canada’s deep X-ray lithography facility at the Canadian Light Source CLS, where he is a Beam Team Leader and Principal Investigator. He is the author of a book chapter, a patent, and more than 60 articles.Dr. Achenbach was the recipient of the Forschungszentrum Karlsruhe “Excellent Young Scientists” award and tenured position (2003) and was appointed as the Canada Research Chair in Micro and Nano Device Fabrication (2005-2015).